Picosun Presents Continuous ALD for Moisture and Oxygen Barriers




ESPOO, Finland, March 4, 2013 /PRNewswire/ -- Picosun Oy, leading Atomic Layer Deposition (ALD) equipment manufacturer, and VTT Technical Research Centre of Finland report notable progress in continuous ALD technology. The water vapour and oxygen transmission rates measured from polymer...

Source : http://www.prnewswire.com/news-releases/picosun-pr...


Mardi 5 Mars 2013

A lire également